Due to the intensive cooperation with the PTB Braunschweig, the German National Metrology Institute, within the research center LENA and the Cluster of Excellence QuantumFrontiers (QF), a laser lithography system is now available for the QF and LENA consortium. At its new site, in the cleanroom in LENA, the Heidelberg Instruments DWL66FS can write microstructures directly into photosensitive layers by scanning a laser beam across a photoresist, with a minimum feature size of 600 nm.
Main features of the system are:
- Minimum feature size: 0.6 microns
- Substrate size: up to 8 x 8 inches
- Over 1M dpi writeable address grid
- 405 nm laser diode
- Environmental chamber with laminar flowbox
- Exchangeable write heads with air-gauge auto focus system
- Gray scale exposures (for 3 dimensional structures)
- Metrology and alignment by a two-camera system
- Two axis plane mirror interferometer positioning control system
Contact:
Vladislav Agluschewitsch
V.Agluschewitsch(at)tu-braunschweig.de
Phone 0531 391-65329
The equipment in the LENA lithography cleanroom was partly funded by the Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) under Germany’s Excellence Strategy – EXC-2123 QuantumFrontiers – 390837967.
