Due to the intensive cooperation with the PTB Braunschweig, the German National Metrology Institute, within the research center LENA and the Cluster of Excellence QuantumFrontiers (QF), a laser lithography system is now available for the QF and LENA consortium. At its new site, in the cleanroom in LENA, the Heidelberg Instruments DWL66FS can write microstructures directly into photosensitive layers by scanning a laser beam across a photoresist, with a minimum feature size of 600 nm.
Main features of the system are:
Minimum feature size: 0.6 microns
Substrate size: up to 8 x 8 inches
Over 1M dpi writeable address grid
405 nm laser diode
Environmental chamber with laminar flowbox
Exchangeable write heads with air-gauge auto focus system
The equipment in the LENA lithography cleanroom was partly funded by the Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) under Germany’s Excellence Strategy – EXC-2123 QuantumFrontiers – 390837967.