Experimental methods and equipment

Material and device technology

• Class 4 clean room
• Metal-ogranic vapor phase epitaxy (MOVPE) of III-nitrides
• Moleculalr beam epitaxy (MBE) of III-nitrides
• Contact technology
• Optical lithography
• Photo-electro-chemical etching

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  Optical spectroscopy

   

• Low-temperature photoluminescence with variable excitation wavelength
• Time-resolved picosecond photoluminescence
• Optical near field spectroscopy
• Optical gain spectroscopy / high excitation
• Ellipsometry VIS UV

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  Elektrical / transport properties

   

• Hall effect
• I(U), P(I) characteristics
• Shubnikow de Hass effect
• Magnetophonon resonance

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  Microscopy

   

• Atomic force microscopy (AFM)
• Optical near field spectroscopy (SNOM)
• Scanning electron microscopy (SEM)
• Transmission electron microscopy (TEM)
• High resolution X-ray diffraction (HR-XRD)

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  Surface analysis

   

• Auger electron microscopy
• Mass spectrometry
• Surface manipulation with electron beam
• Photo and cathodoluminescence